France – Machines et appareils microélectroniques – Equipement de dépôt LPCVD
AI summary
This tender concerns the acquisition of a compact Low Pressure Chemical Vapor Deposition (LPCVD) system for advanced microelectronics research. The equipment must process 300 mm wafers automatically and deposit both undoped and doped silicon (boron or phosphorus) for SOI technology development at 10 nm and beyond.
Suppliers should be specialized manufacturers of semiconductor deposition equipment with proven expertise in LPCVD systems and 300 mm wafer processing technology.
Suppliers must provide a single-tube vertical LPCVD system capable of automated 300 mm wafer handling and precision deposition of silicon with doping capability. System must meet specifications for advanced semiconductor processing at nanoscale dimensions.
Frequently asked questions
What is this tender about?
This tender concerns the acquisition of a compact Low Pressure Chemical Vapor Deposition (LPCVD) system for advanced microelectronics research. The equipment must process 300 mm wafers automatically and deposit both undoped and doped silicon (boron or phosphorus) for SOI technology development at 10 nm and beyond.
What are the requirements for suppliers?
Suppliers must provide a single-tube vertical LPCVD system capable of automated 300 mm wafer handling and precision deposition of silicon with doping capability. System must meet specifications for advanced semiconductor processing at nanoscale dimensions.
What type of company should bid?
Suppliers should be specialized manufacturers of semiconductor deposition equipment with proven expertise in LPCVD systems and 300 mm wafer processing technology.
Who is the buyer?
The buyer is COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES.
Le CEA Grenoble pour ses activités de recherche visant à développer les technologies SOI d'un diamètre de 10 nm et au-delà, le CEA-LETI souhaite acquérir un système LPCVD (Low Pressure Chemical Vapor Deposition) compact basé sur un seul tube vertical. Ce système devra traiter automatiquement des plaquettes de 300 mm destiné au dépôt de silicium non dopé et dopé (avec du bore ou du phosphore).
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Equipement de dépôt LPCVD
Le CEA Grenoble pour ses activités de recherche visant à développer les technologies SOI d'un diamètre de 10 nm et au-delà, le CEA-LETI souhaite acquérir un système LPCVD (Low Pressure Chemical Vapor Deposition) compact basé sur un seul tube vertical. Ce système devra traiter automatiquement des plaquettes de 300 mm destiné au dépôt de silicium non dopé et dopé (avec du bore ou du phosphore).
- PriceLe prix n'est pas le seul critère d'attribution et tous les critères sont énoncés uniquement dans les documents du marché.
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